To address particulate contamination on equipment chucks, Nanoval has developed a comprehensive suite of in-situ cleaning solutions. Our product catalog includes:
SPM: Designed for contaminant removal on high-temperature electrostatic chucks (ESCs).
PPM: Targets contamination on vacuum chucks and lithography tool chucks.
PPM/APM: Formulated for cleaning ultra-high-temperature electrostatic chucks.
Leveraging a proprietary formula and a custom process design, Nanoval's solution is tailored specifically for eliminating contaminants on photomask pods.